nanoManufacturing Science Lab., Dept. of Precision Science and Technology

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YAMAMURA LAB.

MEMBER

Kazuya YAMAMURA

With a motto of “challenging the common sense,” which was the way my former teacher lived his life, I am developing new physiochemical processes with passion. As those who know me will tell you, I am an impatient person and once I’m develop an interest in something, I become “extreme” in my pursuit of the endeavor.

Other Members

Kazuya YAMAMURA

With a motto of “challenging the common sense,” which was the way my former teacher lived his life, I am developing new physiochemical processes with passion. As those who know me will tell you, I am an impatient person and once I’m develop an interest in something, I become “extreme” in my pursuit of the endeavor.

Other Members
Numerically Controlled Plasma CVM Apparatus Plasma etching apparatus utilizing locally generated atmospheric-pressure plasma. Numerical control of the work table allows for figuring shapes with nanometer order precision.
Plasma-assisted Polishing Apparatus Through surface modification by plasma irradiation and removal of the modified layer by soft abrasive grains, 3-inch SiC, GaN, and sapphire wafers can be dry polished with high efficiency and without any damage.
Electrical characteristics measurement setup equipping with surface preparation chambers Under high vacuum conditions, the amount of gas molecules adsorbed onto a semiconductor surface can be controlled at the monolayer level. In addition, by fabricating an electronic device on the semiconductor surface, the impact of adsorbed gas molecules on the electrical characteristics of the device can be evaluated in situ.
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YAMAMURA LAB.

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YAMAMURA LAB.

GALLERY

YAMAMURA LAB.

ACCESS

M1 Building, Room #426,#427

Department of Precision Engineering,

Graduate School of Engineering, Osaka University,

2-1 Yamadaoka,Suita, Osaka 565-0871 Japan

Phone: +81-6-6879-7294

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