YAMAMURA LAB.
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MEMBER
Kazuya YAMAMURA
With a motto of “challenging the common sense,” which was the way my former teacher lived his life, I am developing new physiochemical processes with passion. As those who know me will tell you, I am an impatient person and once I’m develop an interest in something, I become “extreme” in my pursuit of the endeavor.
Kazuya YAMAMURA
With a motto of “challenging the common sense,” which was the way my former teacher lived his life, I am developing new physiochemical processes with passion. As those who know me will tell you, I am an impatient person and once I’m develop an interest in something, I become “extreme” in my pursuit of the endeavor.
Numerically Controlled Plasma CVM Apparatus
Plasma etching apparatus utilizing locally generated atmospheric-pressure plasma. Numerical control of the work table allows for figuring shapes with nanometer order precision.
Plasma-assisted Polishing Apparatus
Through surface modification by plasma irradiation and removal of the modified layer by soft abrasive grains, 3-inch SiC, GaN, and sapphire wafers can be dry polished with high efficiency and without any damage.
Electrical characteristics measurement setup equipping with surface preparation chambers
Under high vacuum conditions, the amount of gas molecules adsorbed onto a semiconductor surface can be controlled at the monolayer level. In addition, by fabricating an electronic device on the semiconductor surface, the impact of adsorbed gas molecules on the electrical characteristics of the device can be evaluated in situ.
YAMAMURA LAB.